引用:
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作者aaaa88
我原本以為都用鹼類顯影...但沒想到真的有用有機溶劑顯影....
Negative PR 是用二甲苯Xylene.
Positive PR 是用氫氧化四甲基氨TMAH......
我查到的是:
負光阻
缺點
•聚合體會吸收顯影溶劑
•光阻膨脹造成解析度變差
半導體製程會拿來用嗎??  |
線寬1um以上還可以用吧,所以很久以前就不用負光阻了
至於organic solvent定義就要謹慎了,就TMAH結構來說,100%organic compound,
你拿它來除PR那等於就把他當solvent了,所以稱他為organic solvent無誤,也並非
所有organic solvent都沒有酸鹼性,所以以酸鹼來判斷是否為organic solvent是錯的。
可以參考perkin elmer分析TMAH的
介紹
引用:
Tetramethylammonium hydroxide (TMAH) is a clear, water-soluble,
strongly alkaline organic solvent which is widely used as a developer in the
photolithography process for semiconductor and Liquid Crystal Display (LCD)
manufacturing. Because of its wide use, the analysis of impurities in TMAHs
becomes more critical in these demanding applications. SEMI Standard
C46-03061 specifies limits for 25% TMAH, generally limiting contamination to
less than 10 ppb for each element, although some users may require lower
levels of impurities.
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